Hydrate your skin without the heaviness with COSRX’s Oil-Free Ultra Moisturizing Lotion
Product Description:
Formulated with 70.8% birch sap, this lightweight lotion provides deep hydration and soothes irritated skin. Its oil-free formula absorbs quickly, leaving your skin feeling fresh, soft, and silky smooth. Ideal for oily, combination, and acne-prone skin, this lotion helps to balance moisture levels and prevent excess sebum production.
Key Ingredients:
- Birch Sap (70.8%): Hydrates and soothes the skin.
- Tea Tree Leaf Oil: Provides antibacterial benefits and helps to calm the skin.
- Panthenol: Soothes and moisturizes the skin.
- Sodium Hyaluronate: Deeply hydrates and plumps the skin.
We believe in providing unparalleled support to our customers. Your questions and concerns matter to us, and we are dedicated to ensuring you feel confident and informed in your choices. Our commitment is to provide helpful guidance, illustrating that we value not just your business but your trust and satisfaction as well.
Hydrate your skin without the heaviness with COSRX’s Oil-Free Ultra Moisturizing Lotion
Product Description:
Formulated with 70.8% birch sap, this lightweight lotion provides deep hydration and soothes irritated skin. Its oil-free formula absorbs quickly, leaving your skin feeling fresh, soft, and silky smooth. Ideal for oily, combination, and acne-prone skin, this lotion helps to balance moisture levels and prevent excess sebum production.
Key Ingredients:
- Birch Sap (70.8%): Hydrates and soothes the skin.
- Tea Tree Leaf Oil: Provides antibacterial benefits and helps to calm the skin.
- Panthenol: Soothes and moisturizes the skin.
- Sodium Hyaluronate: Deeply hydrates and plumps the skin.
We believe in providing unparalleled support to our customers. Your questions and concerns matter to us, and we are dedicated to ensuring you feel confident and informed in your choices. Our commitment is to provide helpful guidance, illustrating that we value not just your business but your trust and satisfaction as well.